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dc.contributor.authorWeber, Reed Alan
dc.date.accessioned2010-02-09T21:11:53Z
dc.date.available2010-02-09T21:11:53Z
dc.date.issued2010-02-09T21:11:53Z
dc.identifier.urihttp://hdl.handle.net/1928/10312
dc.description.abstractMaking use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates.en_US
dc.language.isoen_USen_US
dc.subjectnonlinear opticsen_US
dc.subjectmicroscopyen_US
dc.subjectfemtosecond pulseen_US
dc.subjectthin film damage studiesen_US
dc.subjectthird-harmonic generationen_US
dc.subjectfour-wave mixingen_US
dc.subject.lcshNonlinear optics.
dc.subject.lcshMicroscopy. Materials--Analysis. Optical coatings--Effect of radiation on.
dc.subject.lcshFemtosecond lasers.
dc.subject.lcshSemiconductors--Characterization.
dc.subject.lcshOptical coatings--Effect of radiation on.
dc.subject.lcshHafnium oxide.
dc.subject.lcshPolymethylmethacrylate--Analysis.
dc.subject.lcshSilica, Vitreous--Analysis.
dc.subject.lcshCorundum--Analysis.
dc.titleNonlinear microscopy for material characterizationen_US
dc.typeThesisen_US


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