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Nonlinear microscopy for material characterization

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1928/10312

Nonlinear microscopy for material characterization

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Title: Nonlinear microscopy for material characterization
Author: Weber, Reed Alan
Subject: nonlinear optics
microscopy
femtosecond pulse
thin film damage studies
third-harmonic generation
four-wave mixing
LC Subject(s): Nonlinear optics.
Microscopy. Materials--Analysis. Optical coatings--Effect of radiation on.
Femtosecond lasers.
Semiconductors--Characterization.
Optical coatings--Effect of radiation on.
Hafnium oxide.
Polymethylmethacrylate--Analysis.
Silica, Vitreous--Analysis.
Corundum--Analysis.
Abstract: Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates.
Date: 2010-02-09
URI: http://hdl.handle.net/1928/10312


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