Nonlinear microscopy for material characterization

Author

Reed Alan Weber

Publication Date

2-9-2010

Abstract

Making use of femtosecond laser sources, nonlinear microscopy exhibits inherent 3- dimensional optical sectioning and provides access to previously unstudied aspects of materials. By probing third order nonlinear optical signals determined by the nonlinear susceptibility (chi-3), which is present in all materials, we gain insight not available by conventional linear or electron microscopy. Third-harmonic generation (THG) and four-wave mixing (FWM) microscopy are used to investigate fundamental material parameters. THG microscopy is applied to supplement damage studies of optical coatings by imaging laser induced material modification both above and below damage threshold conditions in HfO2 thin-films. FWM microscopy is employed to investigate FWM signals and implied finite response times in multiple substrates.

Degree Name

Optical Science and Engineering

Level of Degree

Masters

Department Name

Optical Science and Engineering

Document Type

Thesis

Language

English

Recommended Citation

Weber, Reed Alan. "Nonlinear microscopy for material characterization." (2010). https://digitalrepository.unm.edu/ose_etds/46